However, following the work of
Alferov and co-workers, the solid-state group at Varian Associates proposed a
quaternary alloy of 50% (Ga-In) and 50% (As-P) that could in principle be grown
lattice matched on an InP substrate (Antypas et al. 1973). By doing so this
group enunciated the principles by which a general semiconductor alloy could be
grown on a particular substrate (presumably one that is inex-pensive to obtain)
while maintaining the lattice par-ameter of the alloy layer equal to that of
the substrate.This revolutionary idea remained unexploited by all but Varian
Associates; they used it to produce GaxIn1−xAsyP1−y
photocathode photomultiplier tubes for IR detection out to 1.1lm. These
detectors, costing over US$10,000 in 1970 were unique. Unfortunately there were
few customers because IR sources emitting at 1.1lm (beside the light bulb) were
unknown at the time.
The push to develop this new
materials system came from the discovery that glass optical ®bers for tele- communications
required optical sources and de-tectors at 1.3lm and 1.5lm, and not at 0.85lm
where GaAs lasers function. Even strained ternary alloys of GaAs such as Ga-As-Sb
and Ga-In-As with a bandgap corresponding to this wavelength could not be grown
in single-crystal form on GaAs. In the mid-1970s the first solid-state devices
based onGaxIn1−xAsyP1−y were
developed (Pearsall et al. 1976,Hsieh 1976). Materials in this alloy range span
nearly a factor of two in bandgap energy, from 0.75eV(Ga0.47In0.53As,
y=1) to 1.35eV (InP, y=0). The diagram of the fundamental bandgap vs. lattice parameter
in Fig. 1(a) shows this range along the vertical line B. There is an additional
line A for the epitaxial growth of Ga1−xInxAs1−yPy
on GaAs substrates while conserving the lattice parameter of GaAs. Note
carefully that in this case the roles of both gallium and indium and of arsenic
and phosphorus are exchanged. These alloys span the bandgap range from1.43eV
(GaAs, y=0) to 1.9eV (Ga0.51In0.49P, y=1).However, this
alloy system spans nearly the same bandgap range as that of the AlGaAs system,
and is not frequently exploited in devices. Continuing up-ward along line A,
one encounters a new quaternaryalloy (AlyGa1−y)xIn1−xP.
In combination withGa1−xInxPy(y=1, x=0.49),
this system is extensively used for the fabrication of visible laser diodes for
scanners and optical disk players. The solid phase diagram for this quaternary
alloy is shown in Fig. 1(b).The substrate materials that can be used with these
GaInAsP systems are GaAs and InP. After silicon, of course, these materials are
the most often used for semiconductor substrates and are readily available (Adachi
1992, Agrawal and Dutta 1986, Bhattacharya 1993, Madelung et al. 1982, Pearsall
1982, 2000).
In this article, some basic
materials parameters of GaxIn1−xAsyP1−yfor
compositions that can be readily grown lattice matched on InP are compiled.
Where possible, theory has been used to estimate the proper-ties of the Ga1−xInxAs1−yPy
alloy system for com- positions that can be grown lattice-matched on GaAs.In
addition we note other excellent and comprehensive reviews covering materials
properties, epitaxial growth, and device applications of this technologically important
system of semiconductor
alloys.
Highlights
► The thermal
conductivity of InAs on InP (1 1 3)B quantum dots stacks is measured.
► The growth of a
close stack of 100 layers of InAs using AlAs strain compensating layers is
presented.
► New data on the
thermal conductivity of InP n-doped susbtrate are given.
Source: Materials
Science and Engineering: B
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