Cubic AlN (c-AlN) films were deposited on MgO
(100) substrates by laser molecular beam epitaxy (LMBE) technique. The crystal
structure and surface morphology of deposited films with various laser pulse
energy and substrate temperature were investigated. The results indicate that
c-AlN films exhibit the (200) preferred orientation, showing a good epitaxial
relationship with the substrate. The surface roughness of c-AlN films increases
when the laser pulse energy and substrate temperature increase. The film grown
at laser pulse energy of 150 mJ and substrate temperature of 700 °C shows the
best crystalline quality and relatively smooth surface.
Source:IOPscience
For more information, please visit our website: www.semiconductorwafers.net,
send us email at sales@powerwaywafer.com or powerwaymaterial@gmail.com.
No comments:
Post a Comment